| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a defect inspecting method for detecting defects in an object formed on a substrate with high efficiency. <P>SOLUTION: The defect inspecting method for inspecting defects in an object formed on a substrate comprises: a first process of subjecting the prescribed patterns each formed in the divided regions of the substrate, successively to a primary inspection through an optical method, and selecting the regions to be subjected to a secondary inspection from the regions subjected to the primary inspection; and a second process of subjecting the regions selected in the first process, to the secondary inspection by the use of an electron beam to detect defects in the prescribed patterns. <P>COPYRIGHT: (C)2008,JPO&INPIT |
