发明名称 |
Plasma chamber equipped with temperature-controlled focus ring and method of operating |
摘要 |
A temperature-controlled focus ring assembly for use in a plasma chamber that includes a focus ring surrounding a wafer pedestal for confining plasma ions to a top surface of a wafer positioned on the wafer pedestal; a heat transfer means in intimate contact with the focus ring for decreasing or increasing the temperature of the focus ring; and a controller for controlling the temperature of the focus ring to a predetermined value. The invention further discloses a method for operating a plasma chamber equipped with a temperature-controlled focus ring assembly.
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申请公布号 |
US6767844(B2) |
申请公布日期 |
2004.07.27 |
申请号 |
US20020190412 |
申请日期 |
2002.07.03 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD |
发明人 |
HUANG CHUAN-CHIEH |
分类号 |
H01J37/32;H01L21/00;(IPC1-7):H01L21/31 |
主分类号 |
H01J37/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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