RESIST COMPOSITION AND PRODUCTION METHOD OF RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition from which a resist pattern can be produced with an excellent mask error factor and a fewer number of defects.SOLUTION: The resist composition comprises: (A1) a resin having a structural unit represented by formula (aa), and a structural unit represented by formula (a1-1) or a structural unit represented by formula (a1-2); (A2) a resin that is insoluble or poorly soluble in an aqueous alkali solution but changes into soluble with an aqueous alkali solution by an action of an acid and that has no structural unit represented by formula (aa) but has a structural unit containing a hydroxyadamantane group; and (B) an acid generator.SELECTED DRAWING: None