发明名称 |
REDUCTIVE ELECTROLESS GOLD PLATING SOLUTION, AND ELECTROLESS GOLD PLATING METHOD USING THE PLATING SOLUTION |
摘要 |
The present invention has an object to provide an electroless gold plating solution capable of suppressing the corrosion of a substrate metal and realizing excellent wire bondability, and containing no hazardous substance. In order to achieve the object, as a reductive electroless gold plating solution used for formation of an electroless plated gold film on a surface of a plating target by electroless plating, an electroless plating solution containing a water-soluble gold compound, citric acid or a citrate salt, ethylenediaminetetraacetic acid or an ethylenediaminetetraacetate salt, hexamethylenetetramine, and a chain polyamine having an alkyl group having 3 or more carbon atoms and 3 or more amino groups is adopted. |
申请公布号 |
US2016230287(A1) |
申请公布日期 |
2016.08.11 |
申请号 |
US201515025321 |
申请日期 |
2015.08.21 |
申请人 |
KOJIMA CHEMICALS CO., LTD. |
发明人 |
KATO Tomohito;WATANABE Hideto |
分类号 |
C23C18/44 |
主分类号 |
C23C18/44 |
代理机构 |
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代理人 |
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主权项 |
1. A reductive electroless gold plating solution used for formation of an electroless plated gold film on a surface of a plating target, comprising:
a water-soluble gold compound; citric acid or a citrate salt; ethylenediaminetetraacetic acid or an ethylenediaminetetraacetate salt; hexamethylenetetramine; and a chain polyamine having an alkyl group having 3 or more carbon atoms and 3 or more amino groups. |
地址 |
Saitama JP |