发明名称 REDUCTIVE ELECTROLESS GOLD PLATING SOLUTION, AND ELECTROLESS GOLD PLATING METHOD USING THE PLATING SOLUTION
摘要 The present invention has an object to provide an electroless gold plating solution capable of suppressing the corrosion of a substrate metal and realizing excellent wire bondability, and containing no hazardous substance. In order to achieve the object, as a reductive electroless gold plating solution used for formation of an electroless plated gold film on a surface of a plating target by electroless plating, an electroless plating solution containing a water-soluble gold compound, citric acid or a citrate salt, ethylenediaminetetraacetic acid or an ethylenediaminetetraacetate salt, hexamethylenetetramine, and a chain polyamine having an alkyl group having 3 or more carbon atoms and 3 or more amino groups is adopted.
申请公布号 US2016230287(A1) 申请公布日期 2016.08.11
申请号 US201515025321 申请日期 2015.08.21
申请人 KOJIMA CHEMICALS CO., LTD. 发明人 KATO Tomohito;WATANABE Hideto
分类号 C23C18/44 主分类号 C23C18/44
代理机构 代理人
主权项 1. A reductive electroless gold plating solution used for formation of an electroless plated gold film on a surface of a plating target, comprising: a water-soluble gold compound; citric acid or a citrate salt; ethylenediaminetetraacetic acid or an ethylenediaminetetraacetate salt; hexamethylenetetramine; and a chain polyamine having an alkyl group having 3 or more carbon atoms and 3 or more amino groups.
地址 Saitama JP