发明名称 Hybrid ceramic showerhead
摘要 Various implementations of hybrid ceramic faceplates for substrate processing showerheads are provided. The hybrid ceramic showerhead faceplates may include an electrode embedded within the ceramic material of the faceplate, as well as a pattern of through-holes. The electrode may be fully encapsulated within the ceramic material with respect to the through-holes. In some implementations, a heater element may also be embedded within the hybrid ceramic showerhead faceplate. A DC voltage source may be electrically connected with the hybrid ceramic showerhead faceplate during use. The hybrid ceramic faceplates may be easily removable from the substrate processing showerheads for easy cleaning and faceplate replacement.
申请公布号 US9441296(B2) 申请公布日期 2016.09.13
申请号 US201213411369 申请日期 2012.03.02
申请人 Novellus Systems, Inc. 发明人 Sabri Mohamed;Lingampalli Ramkishan Rao;Leeser Karl F.
分类号 H01L21/306;C23F1/00;C23C16/455 主分类号 H01L21/306
代理机构 Weaver Austin Villeneuve & Sampson LLP 代理人 Weaver Austin Villeneuve & Sampson LLP
主权项 1. A gas distributor comprising: a ceramic faceplate for a substrate processing showerhead of a processing chamber, the ceramic faceplate including a first pattern of first through-holes; an electrode including a second pattern of second through-holes; and a contact ring having one or more standoffs, wherein the contact ring and the one or more standoffs are all electrically conductive and electroconductively coupled with one another, wherein: the electrode is embedded within the ceramic faceplate,the second pattern matches the first pattern,the first pattern includes all of the holes through which processing gases flow through the ceramic faceplate when the ceramic faceplate is installed in the substrate processing showerhead of the processing chamber,each second through-hole is larger in size than the corresponding first through-hole,the contact ring encircles the first pattern of first through-holes,the ceramic faceplate includes one or more blind standoff apertures that terminate at the electrode,each standoff extends into a respective blind standoff aperture and is in electrically conductive contact with the electrode, andthe electrode forms either an anode or a cathode of an RF plasma generation system when the ceramic faceplate is installed in the substrate processing showerhead of the processing chamber.
地址 Fremont CA US