发明名称 |
MANUFACTURING METHOD FOR STRUCTURE INCLUDING PHASE SEPARATION STRUCTURE, BLOCK COPOLYMER COMPOSITION AND ORGANIC SOLVENT USED FOR BLOCK COPOLYMER COMPOSITION |
摘要 |
PROBLEM TO BE SOLVED: To provide a manufacturing method for a structure including a phase separation structure.SOLUTION: A manufacturing method for a structure including a phase separation structure comprises a step A of coating a substrate with a block copolymer composition, containing a block copolymer, which is a couple of a block consisting of polystyrene or a polystyrene derivative with other blocks of one or more kinds, and an organic solvent component (S) to form a layer containing the block copolymer and a step B of phase-separating the layer containing the block copolymer, where the value of the interaction distance Ra(MPa) between a Hansen solubility parameter of the organic solvent component (S) and a Hansen solubility parameter of the polystyrene or the polystyrene derivative satisfies the following expression (1).SELECTED DRAWING: None |
申请公布号 |
JP2016209826(A) |
申请公布日期 |
2016.12.15 |
申请号 |
JP20150096328 |
申请日期 |
2015.05.11 |
申请人 |
TOKYO OHKA KOGYO CO LTD |
发明人 |
YAMANO HITOSHI;MATSUMIYA YU;KUROSAWA TSUYOSHI;HIRAYAMA HIROSHI;MIYAGI MASARU;OMORI KATSUMI |
分类号 |
B05D7/24;B05D3/02;C08K5/101;C08L53/00;C09D5/00;C09D7/12;C09D125/06;C09D153/00;H01L21/3065 |
主分类号 |
B05D7/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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