发明名称 SEMICONDUCTOR DEVICE HAVING AN ISOLATION REGION ENRICHED IN OXYGEN AND A FABRICATION PROCESS THEREOF
摘要 <p>A method for growing an epitaxial layer of a group III-V compound semiconductor material that contains oxygen comprises the steps of supplying molecules of an organic compound that contains a group V element and oxygen in the molecule, and decomposing the molecules of the organic compound to release the group V element and oxygen.</p>
申请公布号 WO1992015113(A1) 申请公布日期 1992.09.03
申请号 JP1992000157 申请日期 1992.02.18
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