发明名称 SUBSTRATE TRANSFER DEVICE AND SEMICONDUCTOR MANUFACTURE
摘要 PURPOSE: To provide a transfer device which generates less dust and is completely dry by providing the arm which has no sliding mechanism for holding and developing the substrate. CONSTITUTION: Power of motors 1a and 1b placed on the atmosphere side is introduced into a transfer chamber which contains vacuum atmosphere through permanent magnets 6a, 6b 7a and 7b. The magnets 6a and 6b are placed on the atmosphere side, and the permanent magnets 7a and 7b are placed on the vacuum side, having a thin separating wall of a vacuum flange 5 inbetween so as to independently form a magnetic circuit. The permanent magnets 6b and 7b on the vacuum side are held by driven axes 8a and 8b, and on the circumference of the driven axes 3a and 3b, plate springs 13 and 15 formed of plurality of elastic materials are mounted in a posture that provides rigidity in the gravity direction through turning arms 11a and 11b. The other edges of the plate springs 13 and 15 are connected to a hand 14 which holds a substrate 16. Since the hand and the arm which hold and develop the substrate require no sliding mechanism such as rolling bearing, the low-price transfer device which provides a high development rate by less dust generation and high reliability and a high degree of freedom in development is provided.
申请公布号 JPH08330377(A) 申请公布日期 1996.12.13
申请号 JP19950129998 申请日期 1995.05.29
申请人 HITACHI LTD;HITACHI VIDEO IND INF SYST INC 发明人 KASHIMA HIDEO;MIYATA TOSHIMITSU;KANETOMO MASABUMI;SUZUKI TAKAMICHI;ITO TETSUO
分类号 B08B17/02;H01L21/677;H01L21/68;(IPC1-7):H01L21/68 主分类号 B08B17/02
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