| 摘要 |
PROBLEM TO BE SOLVED: To provide a pattern for superposition accuracy measurement, which can measure superposition accuracy with high precision. SOLUTION: A pattern for superposition accuracy measurement is constituted of a first insular layer region 20 and a second insular layer region 22. The region 20 has a structure that the region 20 is provided with a slit-shaped reference groove 24 formed into a frame type. The groove width of this slit-shaped reference groove 24 is formed in a width of 1 to 2μm. The region 22 has a structure that the region 22 is provided with a slit-shaped joint groove 28 formed into a frame type. The groove width of this slit-shaped joint groove 28 is formed in a width of 1 to 2μm. These regions 20 and 22 are arranged into such a shape that when the pattern for superposition accuracy measurement is seen from above, the periphery of the frame, which is formed of he slit-shaped reference groove 24, is encircled by the frame, which is formed of the slit-shaped joint groove 28. |
