CLEANING METHOD FOR ELECTROSTATIC ATTRACTION ELECTRODE AND ITS DETECTION DEVICE

摘要

PROBLEM TO BE SOLVED: To easily detect the termination of the plasma cleaning of an electrostatic attraction electrode, which supports a wafer processed by a plasma and the like with electrostatic attraction. SOLUTION: A Vpp detection circuit 16 is provided in parallel to a plasma 6, an electrode 10 having an electrostatic attraction electrode 13, a high frequency power source 14, and a high frequency apply circuit formed through a ground part. Vpp during the plasma cleaning of the electrostatic attraction electrode 13 is successively detected. When detected Vpp is matches a value which is previously set, plasma cleaning terminates.