| 摘要 |
PROBLEM TO BE SOLVED: To provide an edge aligner in which the throughput can be enhanced while suppressing increase in size. SOLUTION: Major surface of a substrate W is separated into a pattern area PA for forming a pattern, and an edge area EA not subjected to pattern formation. By adjusting the attitude of a slit for irradiating the substrate W with light, an irradiation area LA being formed at a position of the major surface of the substrate W is shaped into rectangular having the longitudinal direction in the tangential direction of the rotational orbit of the substrate W. Consequently, irradiation width can be increased while sustaining illuminance in the irradiation area LA and suppressing increase in size of the system. Since the rotational speed of the substrate W can be increased as compared with a conventional system, the tact time required for edge exposure can be shortened and the throughput can be enhanced.
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