发明名称 Support device and lightographic apparatus
摘要 To correctly transfer a pattern to a substrate, or transfer any other pattern having small features, a transfer of vibrations from an external support structure, e.g. a floor, is minimized by using a vibration isolation support device, e.g. an airmount. To improve the vibration isolation characteristics of the airmount, the (positive) stiffness of the airmount is lowered by providing a pressure reducer that is configured to reduce a gas pressure change in a gas chamber of the airmount, which pressure change is a result of a volume change of the gas chamber. Due to vibrations the volume of said gas chamber changes. Due to the stiffness reduction device, the corresponding pressure change, and thus a force exerted on the supported object, is reduced, thereby reducing the stiffness of the airmount.
申请公布号 US2006126040(A1) 申请公布日期 2006.06.15
申请号 US20040009549 申请日期 2004.12.13
申请人 ASML NETHERLANDS B.V. 发明人 BUTLER HANS;AUER FRANK;DUIJNHOVEN MARTINUS V.;GERTRUDIS MEIJERS PIETER J.;VAN DER TOORN JAN-GERARD C.;DE PEE JOOST
分类号 G03B27/42 主分类号 G03B27/42
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