| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photo-curing composition capable of forming a hardened material that is excellent in light shielding effects and fine pattern formability, and has resistance properties under a mild condition, and a cured material thereof. <P>SOLUTION: The photo-curing composition for blocking light is composed of a vinyl ether based compounds and a photo-acid-generating agent. The photo-curing composition for shielding light preferably does not contain black pigment or contains 20% or less of black pigment. The difference in the optical density (OD value) of the photo-curing composition for shielding light that does not contain black pigment between the density before curing and the density after curing is 1 or more, for example. The photo-curing composition for shielding light contains alkali soluble binder resin, and can be used for image formation by a lithography method, or can be used for image formation by an ink jet method, for example. The photo-curing composition for shielding light of this kind is particularly preferably used for manufacturing a black matrix for a color filter, a photo spacer for a liquid crystal, etc. <P>COPYRIGHT: (C)2008,JPO&INPIT |
