| 摘要 |
Provided is a substrate inspection device for inspecting a defect of a pattern formed in such a way that in a layered structure including a first layer formed on a substrate and a second layer having different composition from the first layer and formed on the first layer, the second layer is partially exposed. The substrate inspection device includes: electron emitting means for applying primary electrons onto the substrate; electron detecting means for detecting secondary electrons generated by the application of the primary electrons; data processing means for processing data on the secondary electrons detected by the electron detecting means; and voltage control means for controlling primary electron accelerating voltage. The voltage control means controls the acceleration voltage so that the primary electrons reach inside the first layer or the second layer at the portion where the second layer is exposed excluding the vicinity of the boundary between the first layer and the second layer.
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