Imprint apparatus, imprint method, and method for producing device

摘要

An imprint apparatus for transferring a pattern to an imprint material using a mold includes a substrate holding mechanism and a control unit. The substrate holding mechanism is configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the areas and to hold the substrate. The control unit is configured to, when a plurality of shots is formed on the substrate, control an imprint operation of transferring the pattern to the plurality of shots which are not adjacent to one another, makes the attracting force in the area of the substrate holding mechanism corresponding to the shot to which the pattern is transferred among the plurality of areas smaller than the attracting force at the time of the imprint operation and suck the substrate.

主权项

1. An imprint apparatus for forming a pattern of an imprint material on a substrate using a mold, the apparatus comprising:
a substrate holding mechanism configured to be divided into a plurality of areas, capable of varying an attracting force for attracting the substrate in each of the plurality of the areas and holding the substrate; and a control unit; wherein the control unit is configured to perform contacting and separating operations forming patterns not adjacent to one another in a first area of the plurality of the areas, and then perform reducing the attracting force in the first area to a level below the attracting force at the time of the separating operations while holding the substrate in at least one other area of the plurality of the areas, and then increasing the attracting force in the first area.