发明名称 |
DOUBLE-SIDED PRESSURE SENSITIVE ADHESIVE SHEET |
摘要 |
<P>PROBLEM TO BE SOLVED: To provide a pressure sensitive adhesive tape for fixing polishing cloth, which enables polishing of even a semiconductor wafer having smooth unevenness in height and a wafer on which local differences in level are produced during a circuit forming process, thereby the differences in height on the entire surface of the wafer can be reduced evenly along the smooth unevenness in height and the differences in level. <P>SOLUTION: The double-sided pressure sensitive adhesive sheet comprises a soft urethane foam sheet 1 and first and second pressure sensitive adhesive compound layer 2. In the soft urethane foam sheet of the double-sided pressure sensitive adhesive sheet, the difference between the maximum thickness and the minimum thickness within an area of 1 m<SP>2</SP>is not less than 0 μm and not more than 100 μm, and the water vapor permeability is not less than 0 g/m<SP>2</SP>×24h and not more than 1000 g/m<SP>2</SP>×24h. <P>COPYRIGHT: (C)2004,JPO&NCIPI |
申请公布号 |
JP2004253764(A) |
申请公布日期 |
2004.09.09 |
申请号 |
JP20030204042 |
申请日期 |
2003.07.30 |
申请人 |
TOYO INK MFG CO LTD;RODEL NITTA CO |
发明人 |
NAKAO TATSUYA;TAKAHASHI HIDEYUKI;MACHIDA TOSHINORI;YOKOMICHI YASUJI;KATAO YOSHIAKI |
分类号 |
B24B37/20;B24B37/24;B32B5/18;B32B27/40;C09J7/02;C09J201/00;H01L21/304 |
主分类号 |
B24B37/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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