COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN

摘要

PROBLEM TO BE SOLVED: To provide a resist composition having excellent CD uniformity.SOLUTION: The present invention provides a compound represented by formula (I) [Ris a C1-6 alkyl group which may comprise a halogen atom, H or a halogen atom; Ais a single bond or-A-CO-O-; Ais a C1-6 alkanediyl group; Wis a substituted/unsubstituted 4-18 divalent alicyclic hydrocarbon group, preferably an adamantanediyl group; Ris H, a C1-12 hydrocarbon group which may comprise a cyano group; a methylene group included in the hydrocarbon group is optionally substituted by an oxygen atom or a carbonyl group; Ris a C1-12 hydrocarbon group which may comprise a cyano group].SELECTED DRAWING: None