发明名称 Positive photosensitive resin composition.
摘要 <p>A positive photosensitive resin composition contains 50 to 95 parts by weight of a resin (a) composed of a high molecular compound (A) having a molecular weight of 300 to 30,000 and an iodine value of 50 to 500 and containing carbon-carbon double bonds and a group selected from a group represented by the formula (I) <CHEM> wherein R1 denotes a hydrogen atom, a halogen atom or an alkyl group having 1 to 3 carbon atoms and X denotes a hydrogen atom or a bond, on the proviso that if X denotes the bond, a carbon atom linked to R1 and a carbon atom linked to a hydrogen atom together form a portion of a main chain of the high molecular compound (A), and a group represented by the formula (II) <CHEM> wherein R1 and X denote the same as above, and R2 denotes an alkyl, cycloalkyl or aryl group, introduced into said high molecular compound (A), and 5 to 50 parts by weight of a compound (b) containing quinone diazide groups.</p>
申请公布号 EP0582313(A2) 申请公布日期 1994.02.09
申请号 EP19930112666 申请日期 1993.08.06
申请人 NIPPON OIL CO. LTD. 发明人 YODA, EIJI;YUASA, HITOSHI;OTSUKI, YUTAKA
分类号 C08K5/42;C08K5/41;C08L101/00;G03F7/022;G03F7/023;G03F7/039;H05K3/00;H05K3/06;(IPC1-7):G03F7/023 主分类号 C08K5/42
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