Silicon carbide schottky barrier diode and method of making

摘要

A Schottky barrier diode and process of making is disclosed. The process forms a metal contact pattern in masked areas on a silicon carbide wafer. A preferred embodiment includes on insulating layer that is etched in the windows of the mask. An inert edge termination is implanted into the wafer beneath the oxide layer and adjacent the metal contacts to improve reliability. A further oxide layer may be added to improve surface resistance to physical damage.