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发明名称
相位差薄膜及其制造方法
摘要
提供一种相位差层之配向方向受到高精度控制、且制造成本低之相位差薄膜及其制造方法。参照图1做说明。首先,准备一于透明基材10上积层着光学异向性层11之附基材之光学异向性层12。其次,于光学异向性层11上涂布溶液(含有液晶性化合物以及会和偏光紫外线反应之聚合物)后加以乾燥。接着照射偏光紫外线使得该液晶性化合物进行配向,进而依必要性照射非偏光紫外线使得该液晶性化合物交联,以制作出于光学异向性层11上直接形成了相位差层13之相位差薄膜1。
申请公布号
TW200419198
申请公布日期
2004.10.01
申请号
TW093101714
申请日期
2004.01.27
申请人
日东电工股份有限公司
发明人
首藤俊介;小林弘明;松永卓也
分类号
G02B5/30
主分类号
G02B5/30
代理机构
代理人
林镒珠
主权项
地址
日本
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