发明名称 DIFFUSION BONDED SPUTTERING TARGET ASSEMBLY WITH PRECIPITATION HARDENED BACKING PLATE AND METHOD OF MAKING SAME
摘要 Described is a method for producing a diffusion bonded sputtering target assembly which is thermally treated to precipitation harden the backing plate without compromising the diffusion bond integrity. The method includes heat treating and quenching to alloy solution and artificially age the backing plate material after diffusion bonding to a target. Thermal treatment of the diffusion bonded sputtering target assembly includes quenching by partial-immersion in a quenchant and is performed after diffusion bonding and allows for various tempers in the backing plate.
申请公布号 WO9826107(A1) 申请公布日期 1998.06.18
申请号 WO1997US23414 申请日期 1997.12.04
申请人 JOHNSON MATTHEY ELECTRONICS, INC.;BEIER, ANTHONY, F.;KARDOKUS, JANINE, K.;STROTHERS, SUSAN, D. 发明人 BEIER, ANTHONY, F.;KARDOKUS, JANINE, K.;STROTHERS, SUSAN, D.
分类号 C22F1/00;C21D1/06;C21D1/18;C22C21/00;C22F1/04;C22F1/08;C22F1/18;C23C14/34;(IPC1-7):C23C14/34;B23K20/00;B23K31/02;B32B15/00;B32B15/10;B32B15/20;C21D1/09 主分类号 C22F1/00
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