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发明名称
PHOTORESIST COPOLYMER AND THE CHEMICAL AMPLIFIED POSITIVE PHOTORESIST COMPOSITION CONTAINING THE SAME
摘要
申请公布号
KR100249090(B1)
申请公布日期
2000.06.01
申请号
KR19980007259
申请日期
1998.03.05
申请人
KOREA KUMHO PETROCHEMICAL CO.,LTD
发明人
KIM, KI DAE;PARK, JOO HYEON;KIM, JI HONG;KIM, SEONG JU
分类号
G03F7/039;(IPC1-7):G03F7/039
主分类号
G03F7/039
代理机构
代理人
主权项
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