| 发明名称 |
Lithographic apparatus and device manufacturing method utilizing multiple die designs on a substrate |
| 摘要 |
A lithographic system in which multiple variations of a basic device design can be generated without substantially increasing the cost of the data path hardware.
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| 申请公布号 |
US2006221320(A1) |
申请公布日期 |
2006.10.05 |
| 申请号 |
US20050098607 |
申请日期 |
2005.04.05 |
| 申请人 |
ASML NETHERLANDS B.V. |
发明人 |
BLEEKER ARNO J.;TROOST KARS Z.;MAAS ADRIANUS J.H. |
| 分类号 |
G03B27/54 |
主分类号 |
G03B27/54 |
| 代理机构 |
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代理人 |
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