发明名称 PATTERN INSPECTION APPARATUS AND METHOD
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a pattern inspection apparatus and a method for inspecting an inspection target pattern using an image of the inspection target pattern and data to be used in manufacturing the target pattern such as design data. <P>SOLUTION: The pattern inspection apparatus for inspecting by means of the image of the inspection target pattern and the data to be used in manufacturing the target pattern includes a generating means for generating a reference pattern expressed by line segments or curves from the data, a generating means for generating the image of the inspection target pattern, a means for detecting edges of the image of the target pattern, and an inspecting means for inspecting the inspection target pattern by comparing the edges of the image of the target pattern with the reference pattern expressed by the line segments or curves. The inspecting means for inspecting the target pattern inspects using a deformation quantity of each target pattern. <P>COPYRIGHT: (C)2008,JPO&INPIT</p>
申请公布号 JP2008164593(A) 申请公布日期 2008.07.17
申请号 JP20070299357 申请日期 2007.11.19
申请人 NANO GEOMETRY KENKYUSHO:KK 发明人 KITAMURA TADASHI;HASEBE TOSHIAKI;TSUNEOKA MASATOSHI
分类号 G01B15/04;G01N23/225;G03F1/84;G03F1/86;G06T1/00;H01L21/66 主分类号 G01B15/04
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