发明名称 RADIATION SENSITIVE RESIN COMPOSITION FOR FORMING A PROTECTIVE FILM, METHOD OF FORMING A PROTECTIVE FILM FROM THE COMPOSITION, LIQUID CRYSTAL DISPLAY DEVICE AND SOLID-STATE IMAGE SENSING DEVICE
摘要 A radiation sensitive resin composition for forming a protective film, comprising: [A] a copolymer of (a1) an unsaturated carboxylic acid and/or an unsaturated carboxylic anhydride, (a2) an epoxy group-containing unsaturated compound and (a3) an unsaturated compound different from the components (a1) and (a2); [B] a monofunctional polymerizable unsaturated compound having a molecular weight of 180 or more and a carboxyl group; [C] a polyfunctional polymerizable unsaturated compound; and [D] a photopolymerization initiator, a method of forming a protective film from the above composition and a protective film formed from the above composition. The composition can provide a cured film having high flatness, has high developability and heat resistance, is advantageously used to form a protective film for liquid crystal display devices and solid-state image sensing devices, and has high storage stability as a composition.
申请公布号 US2008233515(A1) 申请公布日期 2008.09.25
申请号 US20080051037 申请日期 2008.03.19
申请人 JSR CORPORATION 发明人 ITO YUKIKO;ICHINOHE DAIGO;KAJITA TORU
分类号 G03F7/004;G03F7/00 主分类号 G03F7/004
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