发明名称 Plasma device
摘要 An etching apparatus has an antenna connected to a radio frequency power supply through a matching box. At the center region of a dielectric plate, a columnar conductor and a cylindrical conduct ring are arranged. Between the columnar conductor and the conductor ring, four conducting wires, each of which forms a substantially circular loop outside the conductor ring, are connected in parallel with the radio frequency power supply. A loop formed by each of the conducting wires is arranged at an equal spacing with each other to be rotationally-symmetric around the axis orthogonal to a mounting table, with the columnar conductor as the center. The loops are arranged on the same plane such that a surface where each loop is placed faces the mounting table.
申请公布号 US7481904(B2) 申请公布日期 2009.01.27
申请号 US20040508055 申请日期 2004.09.17
申请人 TOKYO ELECTRON LIMITED 发明人 ISHII NOBUO
分类号 C23F1/00;C23C16/00;H01J37/32;H01L21/306 主分类号 C23F1/00
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