| 摘要 |
An electrode member and a substrate treating apparatus including the same are provided to control temperature of a top electrode and a bottom electrode. A substrate treating apparatus includes a chamber(120) and an electrode member. The electrode member is positioned inside the chamber, generates plasma in an inner space of the chamber, and includes an electrode plate(140) and a cooling unit. The cooling unit has a plurality of thermoelectric modules(10). A plurality of thermoelectric modules is contacted with the electrode plate. A front side of the electrode plate is faced with a plasma generating space. A plurality of installation holes(142) is formed on a rear side of the electrode plate. A plurality of thermoelectric modules is respectively mounted on a plurality of installation holes. |
