发明名称 VACUUM PROCESSING APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a vacuum processing apparatus capable of improving the operation rate.SOLUTION: The vacuum processing apparatus includes: a system control unit 208; a processing module in which a sample is processed in a vacuum; an operation control unit 213 that controls the operation of the processing module; and an intermediate control unit 209 that transmits a signal from a system control unit 208 to an operation control unit 213. The intermediate control unit 209 has a conversion section that converts signals from the system control unit 208, and has a function to carry out at least a part of control function in place of the operation control unit 213.SELECTED DRAWING: Figure 3
申请公布号 JP2016213394(A) 申请公布日期 2016.12.15
申请号 JP20150097910 申请日期 2015.05.13
申请人 HITACHI HIGH-TECHNOLOGIES CORP 发明人 SHINOMIYA MITSUHIRO;MIYATA YOJI;YAMAGUCHI HIDETOSHI
分类号 H01L21/677;C23C16/50;C23C16/52;H01L21/02;H01L21/3065;H01L21/31 主分类号 H01L21/677
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