MARK DETECTION MECHANISM USING TRANSMISSION ELECTRON

摘要

PURPOSE:To make the title mechanism compact in structure by a method wherein a hole for an electron beam passage is formed in a material fixing holder and a transmission electron beam detector is buried in the bottom part of a material moving stage. CONSTITUTION:Electron beams Bi are accelerated and converged and thereafter, are converged by a final lens 5 and are irradiated on a material 1 through a deflector 14. Marks 1a and electron passage regions 1b are formed on the surface of the material 1 and transmission electrons (e') reach to a transmission electron detector 13 buried in the bottom part of a recess 11a via a hole 12a of a material fixing holder 12 and the recess 12a of a material moving stage 11. The amount of incident electron beams is changed by the form of the marks 1a. Accordingly, the positions of the marks 1a can be detected by a normal mark detection method.