| 摘要 |
<p>PURPOSE:To provide the process for production of the color filter capable of inexpensively producing fine patterns with good accuracy at a high yield. CONSTITUTION:The surface of a substrate 1 is provided with resin layers 2 to be dyed and isolation layers 3 which consist of a light shielding material and isolate the resin layers 2 to be dyed from a photoresist 4. Mask patterns are then formed by the photoresist 4 on the isolation layers 3 and the isolation layers 3 of the exposed parts are removed by etching. The resin layers 2 to be dyed of windowed parts are dyed to form dyed parts R, G, B. Black stripes are formed simultaneously with the formation of the dyed parts R, G, B by the isolation layers remaining without being etched.</p> |
