| 摘要 |
PROBLEM TO BE SOLVED: To make it possible to automate the specification of the deflection region of an optical system including abnormal patterns by transforming the abnormal pattern coordinates of a mask to be investigated which are expressed by the coordinate system different from the coordinate system of an exposure device to the coordinate system of the exposure device. SOLUTION: The coordinate system (the coordinate system of the inspection apparatus 20) of data A is transformed to the coordinate system of the exposure device 10. The pattern array information file 12 used for the exposure of the mask to be inspected is acquired from the exposure device 10. This pattern array information file 12 (data B) and the data A after the coordinate transformation are compared. The abnormal pattern coordinates on the data B are specified. Further, the polarizer region of the optical system of the exposure device 10 is specified from the abnormal pattern coordinates. The specified sub-deflection region is pinpointed to the accuracy (the accuracy of the data A) of the inspection apparatus 20 and the final region including the abnormal pattern is specified and thereafter, a magnified image of an arbitrary range centering at this region is displayed on a display. In addition, various kinds of the data necessary for debugging are printed in a list and are stored into a storage device. |
