发明名称 FIELD EFFECT SEMICONDUCTOR DEVICE HAVING DIPOLE BARRIER
摘要 A field effect semiconductor device including a substrate, a dipole barrier formed on the substrate, a channel layer formed on the dipole barrier, and source, gate and drain electrodes formed on the channel layer. The dipole barrier provides a potential barrier and a maximum electric field sufficient to confine electrons to the channel layer.
申请公布号 CA2323747(A1) 申请公布日期 1999.09.10
申请号 CA19992323747 申请日期 1999.03.04
申请人 WELCH ALLYN, INC. 发明人 SHEALY, JAMES RICHARD;EASTMAN, LESTER FUESS
分类号 H01L29/10;H01L29/812;(IPC1-7):H01L29/772 主分类号 H01L29/10
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