ALKALINE DEVELOPER FOR RADIATION SENSITIVE COMPOSITION

摘要

PROBLEM TO BE SOLVED: To provide an alkaline developer for a radiation sensitive compsn. which leaves no undissolved material even when the concn. of a pigment contained in the compsn. is high, does not cause problems such as the occurrence of scum, incomplete development and resticking and can form a pixel having sharp pattern edges. SOLUTION: This alkaline developer comprises an aq. soln. contg. at least one inorg. alkaline compd. and at least one org. alkaline compd. selected from the group consisting of alkanolamines and alkylamines or further contains at least one nonionic surfactant selected from the group consisting of etherified polyoxyethylenes and etherified polyoxyethylene-polyoxypropylene block copolymers.