发明名称 DEFLECTOR, AND CHARGED PARTICLE BEAM EXPOSURE SYSTEM
摘要 PROBLEM TO BE SOLVED: To provide a deflector which can limit the magnitude of the required exciting current while maintaining a large deviation distance. SOLUTION: A first element deflector 16 which consists of a coil 16a and an element deflector 17 which consists of a coil 17a are arranged so that their directions may not intersect perpendicularly. As a result, the component of the maximum deflection field generated by the two element deflectors 16, 17 becomes maximum in an X axis direction and minimum in a Y axis direction when the specifications of the element deflectors 16, 17 are the same. Hence, the maximum current which is made to flow in the element deflectors 16, 17 can be reduced in a case that a large deflection amount is needed in the X axis direction, but is not needed in the Y axis direction when exposure is performed. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2005050888(A) 申请公布日期 2005.02.24
申请号 JP20030203442 申请日期 2003.07.30
申请人 NIKON CORP 发明人 KAMIJO KOICHI
分类号 H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/027
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