发明名称 |
Vibration isolator, device manufacturing apparatus and method, semiconductor manufacturing plant and method of maintaining device manufacturing apparatus |
摘要 |
A vibration isolator includes a vibration isolation platform, a vibration sensor installed on the vibration isolation platform, and an angle sensor for sensing an inclination angle of the vibration isolation platform. A detection signal from the vibration sensor is corrected based upon an output from the angle sensor, and the corrected detection signal is used in order to suppress vibration of the vibration isolation platform.
|
申请公布号 |
US6825635(B2) |
申请公布日期 |
2004.11.30 |
申请号 |
US20020102726 |
申请日期 |
2002.03.22 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
KATO HIROAKI |
分类号 |
G03F7/20;F16F15/02;G05D19/02;H01L21/027;(IPC1-7):H01L21/30 |
主分类号 |
G03F7/20 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|