METHOD OF CONTAMINATING A PART OF SILICON WAFER USING METALLIC IMPURITY,申请号KR20050103394-传众专利搜索

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发明名称	METHOD OF CONTAMINATING A PART OF SILICON WAFER USING METALLIC IMPURITY
摘要
申请公布号	KR20070046567(A)	申请公布日期	2007.05.03
申请号	KR20050103394	申请日期	2005.10.31
申请人	SILTRON INC.	发明人	LEE, SEUNG WOOK;WEE, SANG WOOK
分类号	H01L21/66;H01L21/02	主分类号	H01L21/66
代理机构		代理人
主权项
地址

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