发明名称 APPARATUS FOR MANUFACTURING SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide an apparatus for manufacturing semiconductors capable of flexibly constituting a route, where wafers successively pass a plurality of treatment chambers. SOLUTION: The semiconductor manufacturing apparatus comprises two treatment units 30 that are constituted of two conveyance chambers 40, and a treatment chamber 31 arranged between the conveyance chambers 40, and has a treatment path, where wafers 26 are conveyed to the other treatment chamber 40, from one treatment chamber 40 via the treatment chamber 31. Respective treatment units 30 are mutually connected and the treatment paths are mutually connected, so that an arbitrary conveyance chamber 40 and other conveyance chambers 40 on the connected treatment paths are the starting and ending points, respectively, of treatment. COPYRIGHT: (C)2008,JPO&INPIT
申请公布号 JP2008028036(A) 申请公布日期 2008.02.07
申请号 JP20060197226 申请日期 2006.07.19
申请人 PHYZCHEMIX CORP 发明人 HASHIMOTO TAKUYA
分类号 H01L21/677;C23C16/44 主分类号 H01L21/677
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