发明名称 Process for making a patterned metal oxide structure
摘要 There is provided a process for making a patterned metal oxide structure comprising the step of heating an imprint structure comprising a polymerized organometallic compound to remove organic material and thereby form the patterned metal oxide structure, wherein the imprint structure is formed by polymerizing a resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having, e.g., at least one carboxylate of Formula 1:; wherein n is 1-12; andeach R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloakyl, cycloakenyl, aryl, and aralkyl.
申请公布号 US9362126(B2) 申请公布日期 2016.06.07
申请号 US201213625400 申请日期 2012.09.24
申请人 AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH 发明人 Ganesan Ramakrishnan;Dumond Jarrett;Saifullah M. S. M.;Lim Su Hui;Hussain Hazrat;Low Hong Yee
分类号 G03F7/00;H01L21/283;C23C18/04;C23C18/06;C23C18/12;B81C1/00;B82Y40/00;G03F7/004;G03F7/027;B82Y10/00;H01L29/06 主分类号 G03F7/00
代理机构 Conley Rose, P.C. 代理人 Conley Rose, P.C.
主权项 1. A process for making a patterned metal oxide structure comprising the steps of: (a) polymerizing a resist mixture, while in contact with a mold having imprint forming patterns thereon, to thereby form an imprint structure comprising a polymerized organometallic compound, said resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having at least one carboxylate of Formula 1: wherein n is 1-12; and each R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, cycloakenyl, aryl, and aralkyl; and (b) heating said imprint structure to remove organic material and thereby form said patterned metal oxide structure.
地址 Singapore SG
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