发明名称 |
Process for making a patterned metal oxide structure |
摘要 |
There is provided a process for making a patterned metal oxide structure comprising the step of heating an imprint structure comprising a polymerized organometallic compound to remove organic material and thereby form the patterned metal oxide structure, wherein the imprint structure is formed by polymerizing a resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having, e.g., at least one carboxylate of Formula 1:;
wherein
n is 1-12; andeach R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloakyl, cycloakenyl, aryl, and aralkyl. |
申请公布号 |
US9362126(B2) |
申请公布日期 |
2016.06.07 |
申请号 |
US201213625400 |
申请日期 |
2012.09.24 |
申请人 |
AGENCY FOR SCIENCE, TECHNOLOGY AND RESEARCH |
发明人 |
Ganesan Ramakrishnan;Dumond Jarrett;Saifullah M. S. M.;Lim Su Hui;Hussain Hazrat;Low Hong Yee |
分类号 |
G03F7/00;H01L21/283;C23C18/04;C23C18/06;C23C18/12;B81C1/00;B82Y40/00;G03F7/004;G03F7/027;B82Y10/00;H01L29/06 |
主分类号 |
G03F7/00 |
代理机构 |
Conley Rose, P.C. |
代理人 |
Conley Rose, P.C. |
主权项 |
1. A process for making a patterned metal oxide structure comprising the steps of:
(a) polymerizing a resist mixture, while in contact with a mold having imprint forming patterns thereon, to thereby form an imprint structure comprising a polymerized organometallic compound, said resist mixture comprising at least one olefinic polymerizable compound and a polymerizable organometallic compound having at least one carboxylate of Formula 1: wherein n is 1-12; and each R is independently selected from the group consisting of hydrogen, alkyl, alkenyl, alkynyl, cycloalkyl, cycloakenyl, aryl, and aralkyl; and (b) heating said imprint structure to remove organic material and thereby form said patterned metal oxide structure. |
地址 |
Singapore SG |