| 摘要 |
Systems, methods and apparatus for regulating ion energies in a plasma chamber and chucking a substrate to a substrate support are disclosed. An exemplary method includes placing a substrate in a plasma chamber, forming a plasma in the plasma chamber, controllably switching power to the substrate so as to apply a periodic voltage function (or a modified periodic voltage function) to the substrate, and modulating, over multiple cycles of the periodic voltage function, the periodic voltage function responsive to a defined distribution of energies of ions at the surface of the substrate so as to effectuate the defined distribution of ion energies on a time-averaged basis. |
| 主权项 |
1. A method for providing a modified periodic voltage function to an electrical node, the electrical node configured for electrically-coupling to a substrate support of a plasma processing chamber, the method comprising:
obtaining an effective capacitance value, C1, of the substrate support; storing the effective capacitance value, C1, in a memory; providing an ion current compensation, IC, to the electrical node; providing a periodic voltage function to the electrical node, the periodic voltage function being modified by the ion current compensation, IC, to form the modified periodic voltage function; providing the modified periodic voltage function to the electrical node, the modified periodic voltage function having pulses and a portion between the pulses; accessing the memory to retrieve the effective capacitance value, C1; determining a slope, dV0/dt, of the portion between the pulses of the modified periodic voltage function; and controlling a DC current source to adjust a magnitude of the ion current compensation, IC, applied to the substrate support untilⅆV0ⅆt=ICC1. |
