POSITIVE PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM

摘要

PROBLEM TO BE SOLVED: To provide a positive photosensitive resin composition and a cured film from which such a bank can be formed that achieves both of liquid repellency of the bank and liquid affinity of a substrate, and preferably, that has excellent storage stability and small changes in the liquid repellency with time.SOLUTION: A fluorocarbon resin (C) having a specific structure and a crosslinking agent (D) are incorporated into a positive photosensitive resin composition comprising a novolac resin (A) and a photosensitive agent (B). The fluorocarbon resin (C) comprises: at least one fluorine-containing unit (C1) selected from a unit derived from an unsaturated compound including a perfluoroalkylene ether group and a unit derived from a fluorinated alkylester of an unsaturated carboxylic acid; and a unit (C2) derived from an unsaturated compound having a carboxyl group protected by an acid dissociable group or a phenolic hydroxyl group protected by an acid dissociable group.SELECTED DRAWING: None