| 摘要 |
PROBLEM TO BE SOLVED: To provide a cutting device and an applique sewing method which allow alignment between a pattern and a base cloth to be accurately and easily performed.SOLUTION: A cutting device acquires cutting data for a selected pattern (S13). The cutting device cuts the selected pattern along a profile out of a workpiece cloth on the basis of the acquired cutting data (S15). Then, the cutting device reads an image including a label stuck within the profile of the selected pattern to acquire image data. On the basis of the cutting data and the acquired image data, the cutting device identifies the position and angle of the label with respect to the profile of the selected pattern to generate positional relationship data (S21 and S25). The positional relationship data is data in which the cutting data and information on the identified position and angle are associated with each other.SELECTED DRAWING: Figure 9 |
