发明名称 |
THIN FILM TRANSISTOR, DISPLAY APPARATUS INCLUDING THE THIN FILM TRANSISTOR, AND METHOD OF MANUFACTURING THE THIN FILM TRANSISTOR |
摘要 |
A thin film transistor includes: a substrate, a semiconductor layer disposed on the substrate, a first gate electrode and a second gate electrode disposed on the semiconductor layer, a gate insulating layer disposed between the semiconductor layer and the first and second gate electrodes and having a first through hole between the first and second gate electrodes and a capping layer covering the first gate electrode and contacting the semiconductor layer via the first through hole. The capping layer includes a conductive material. |
申请公布号 |
US2016240688(A1) |
申请公布日期 |
2016.08.18 |
申请号 |
US201615141325 |
申请日期 |
2016.04.28 |
申请人 |
SAMSUNG DISPLAY CO., LTD. |
发明人 |
LEE YUL-KYU;Cho Kyu-Sik;Park Sun |
分类号 |
H01L29/786;H01L27/12;H01L29/49;H01L29/66 |
主分类号 |
H01L29/786 |
代理机构 |
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代理人 |
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主权项 |
1. A method of manufacturing a thin film transistor, comprising:
forming a semiconductor layer on a substrate; forming a gate insulating layer covering the semiconductor layer; forming a first gate electrode and a second gate electrode on the gate insulating layer; forming a first through hole in a region of the gate insulating layer between the first gate electrode and the second gate electrode exposing the semiconductor layer; and forming a capping layer including a conductive material covering the second gate electrode and contacting the semiconductor layer via the first through hole. |
地址 |
YONGIN-SI KR |