| 主权项 |
1. A pattern forming method comprising:
forming a film using an actinic ray-sensitive or radiation-sensitive resin composition including (A) a resin which has an increase in the polarity by the action of an acid, and thus, has a decrease in the solubility in a developer containing an organic solvent, (B) a compound capable of generating an acid upon irradiation with actinic ray or radiation, represented by the following General Formula (ZI-3) or (ZI-4), and (C) a solvent; exposing the film; and developing the exposed film using a developer including an organic solvent, wherein the resin (A) has a structure in which a polar group is protected with a leaving group that decomposes to leave by the action of an acid, and the leaving group is a group represented by the following General Formula (I): in General Formula (I), Z represents a group which is combined with a carbon atom to form a ring structure, Ra1 to Ra3 each independently represent an organic group, at least two members out of Ra1 to Ra3 may be bonded to each other to form a ring, and * represents a direct bond; in General Formula (ZI-3), R1c to R5c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, an aryl group, an alkoxy group, an aryloxy group, an alkoxycarbonyl group, an alkylcarbonyloxy group, a cycloalkylcarbonyloxy group, a halogen atom, a hydroxyl group, a nitro group, an alkylthio group, or an arylthio group, R6c and R7c each independently represent a hydrogen atom, an alkyl group, a cycloalkyl group, a halogen atom, a cyano group, or an aryl group, Rx and Ry each independently represent an alkyl group, a cycloalkyl group, a 2-oxoalkyl group, a 2-oxocycloalkyl group, an alkoxycarbonylalkyl group, an allyl group, or a vinyl group, among any two or more members out of R1c to R5c, R5c and R6c, R6c and R7c, R5c and Rx, and Rx and Ry each may be bonded to each other to form a ring structure, and the ring structure may contain an oxygen atom, a sulfur atom, a ketone group, an ester bond, or an amide bond, and Zc− represents a non-nucleophilic anion; and in General Formula (ZI-4), R13 represents a group having a hydrogen atom, a fluorine atom, a hydroxyl group, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, or a cycloalkyl group, R14's, in the case where they are present in plural numbers, each independently represent a group having a hydroxyl group, an alkyl group, a cycloalkyl group, an alkoxy group, an alkoxycarbonyl group, an alkylcarbonyl group, an alkylsulfonyl group, a cycloalkylsulfonyl group, or a cycloalkyl group, R15's each independently represent an alkyl group, a cycloalkyl group, or a naphthyl group, two R15's may be bonded to each other to form a ring, and the ring structure may contain an oxygen atom, a sulfur atom, a ketone group, an ester bond, or an amide bond, l represents an integer of 0 to 2, r represents an integer of 0 to 8, and Z− represents a non-nucleophilic anion. |
