| 摘要 |
PROBLEM TO BE SOLVED: To provide a compound, a resin to be used for a resist composition, and a resist composition, from which a resist pattern can be produced with excellent line edge roughness.SOLUTION: The resist composition comprises: a resin comprising a structural unit having an acid-labile group derived from a compound represented by formula (I) and a structural unit having no acid-labile group; and an acid generator. In the formula, Rrepresents a hydrogen atom or a methyl group; Rto Reach represent a hydrogen atom or a hydrocarbon group, in which -CH- in the hydrocarbon group may be replaced by -O- or -CO- and two or more in Rto Rmay form a ring; m and n each represent an integer of 0 to 5; Rand Reach represent an alkyl group; Arepresents a single bond or *-L-CO-O-(L-CO-O)-, where Land Leach represent a divalent hydrocarbon group and g represents 0 or 1; X represents -CO or a group represented by formula (aa); Xand Xeach represent O or S; Xrepresents a divalent saturated hydrocarbon group which may contain a fluorine atom; and * represents a bonding site.SELECTED DRAWING: None |
