| 摘要 |
PROBLEM TO BE SOLVED: To stabilize the coating property, adhesive property, and exposing condition of a resist, so that a pattern can be formed as designed by providing conductivity areas for adding the functions of by-pass diodes in flat sections. SOLUTION: Conductivity regions for adding the functions of by-pass diodes are formed in the flat sections 22 of a texture structure 13. Namely, when a texture shape 13 is formed on the light-receiving surface of a P-type silicon 1, the flat sections 22 are formed in the areas proposed for the formation of island-like P<+> -type areas. In other words, after an oxide film 9 has been formed on the surface of the P-type silicon substrate 1, the film 9 is removed from the rear surface of the substrate 1 openings 14 and 14 are formed through the oxide film 9 in the flat sections 22 on the front surface of the substrate 1 by lithography, etc. When a P<+> -type impurity is diffused in the front and rear surfaces of the substrate 1 at a prescribed concentration and the oxide film 9 is removed from the front surface and the side faces of the substrate 1, the island-like P<+> -type regions 4 and 4 are formed in the flat sections 22 on the surface of the substrate 1. It is easy to uniformly apply a resist to the flat sections 22. |
