| 摘要 |
PROBLEM TO BE SOLVED: To provide a processing device wherein discharge channel for gas and liquid is shortened as much as possible for improved discharge efficiency, with improved maintenance characteristics. SOLUTION: A processing device comprises a transportation channel unit 15, a plurality of processing units 21-29 which, provided on both sides of them, performs various processes with a substrate G, a main transportation device 18 which, moving in the transportation channel units 15 and 16, transports the substrate G being placed while delivers the substrate G with the processing units 21-29, and a discharge channel for air-discharge or liquid discharge from the processing units 21-29. The discharge channel is allocated below a case of the transportation channel unit 15. |
