| 摘要 |
PROBLEM TO BE SOLVED: To provide a treating apparatus for substrates constituted in such a manner that the substrates may be held in a perpendicular state and that the organic matter adhered to both flanks thereof may be well decomposed away. SOLUTION: The treating apparatus for the substrate, which decomposes away the organic matter adhered to the substrate by irradiating the substrate with UV rays, includes a main body 5 having a space part 6a in which the substrate 4 is housed in nearly the perpendicular state, a UV lamp 19 with which both flanks of the substrate housed in the space part are irradiated with the UV rays, respectively, a heater 9 which is disposed on or over the space part and heats the substrate housed in the space part to a prescribed temperature to accelerate the decomposition and removal of the organic matter by the UV rays and a discharge pump 12 which is disposed in communication with the lower part of the space part and discharges the atmosphere in the space part from the lower part.
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