ULTRAPURE WATER FOR CLEANING ELECTRONIC PART, CLEANING METHOD AND METHOD FOR MAKING ULTRAPURE WATER

摘要

PROBLEM TO BE SOLVED: To provide ultrapure water for cleaning electronic parts by which the amount of amines, which might adversely affect the physical properties of a semiconductor device, to remain on the electronic parts such as a silicon wafer can be reduced and to provide a method for making the ultrapure water and a method for cleaning the electronic parts by using the ultrapure water. SOLUTION: The concentration of each of the amines in this ultrapure water is reduced to <=1 μg/l, particularly that of trimethylamine is reduced to <=0.05 μg/l.