METHOD AND APPARATUS FOR MEASURING DIMENSION OF MICRO STRUCTURE TO REDUCE MEASURING PERIOD

摘要

PURPOSE: A method and an apparatus for measuring a dimension of a micro structure are provided to reduce a measuring period by producing simultaneously dimensions of each micro structure. CONSTITUTION: An irradiation process is performed to irradiate the first electrons to a micro structure(S11). The second electrons are detected from the micro structure and image data are provided(S12). Two or more measuring ranges for the micro structure are set up by using the image data(S13,S14). Dimensions corresponding to the measuring ranges for the micro structure are calculated(S15). The micro structure includes one or more selected from a line, a hole, a groove, and a space formed on a semiconductor substrate.