发明名称 PHOTOSENSITIVE RESIN COMPOSITION, AND MANUFACTURING METHOD FOR INSULATING RESIN PATTERN AND ORGANIC ELECTROLUMINESCENCE ELEMENT USING IT
摘要 <P>PROBLEM TO BE SOLVED: To provide a photosensitive resin composition, exhibiting excellent insulation even in low-temperature burning at 150&deg;C. <P>SOLUTION: This photosensitive resin composition includes: (a) polyamide resin, (b) acrylic resin, (c) a photoacid generator, and (d) heat cross-linking compound, wherein the weight average molecular weight of (b) the acrylic resin is 5,000-30,000. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009020246(A) 申请公布日期 2009.01.29
申请号 JP20070181800 申请日期 2007.07.11
申请人 TORAY IND INC 发明人 MIYOSHI KAZUTO;TOMIKAWA MASAO
分类号 G03F7/023;C08G73/10;H01L21/027 主分类号 G03F7/023
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